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New Report Covers Global Nanolithography Equipment Market 2016-2020

Report : Global Nanolithography Equipment Market 2016-2020 is a new market research publication announced by Reportstack.

Report Outline: Nanolithography is the art and science of using lithographic techniques — like photolithography, nanoimprint lithography, X-ray lithography, and extreme ultraviolet (EUV) lithography — to produce nanostructures and devices.

Nanolithography equipment is used to print complex nanometer-scale circuit patterns onto silicon wafers. This printing process is one of the most critical and expensive steps in wafer fabrication. The focus of the semiconductor industry is, therefore, toward the development of cost-efficient enhancements to production technology. The cost involved in R&D and in the development of new nanolithography equipment is very high. Thus, the nanolithography equipment industry is characterized by the presence of only a few primary suppliers holding the majority of the market.

For detailed report with TOC, please click here ​Global Nanolithography Equipment Market 2016-2020.

Market Growth: The global nanolithography equipment market is expected to grow at a CAGR of 0.16% during the period 2016-2020.

Key vendors 
• ASML 
• Canon U.S.A. 
• Leica 
• Raith 
• SUSS MicroTec

Other prominent vendors 
• Rolith
• Nanoink Optical Associates
• Nanonics Imaging
• JC Nabity Lithography Systems
• NIL Technology

Regions Covered: 

• Americas
• APAC
• EMEA 

Companies Mentioned

ASML, Canon U.S.A, Leica, Raith, SUSS MicroTec, Rolith, Nanoink Optical Associates, Nanonics Imaging, JC Nabity Lithography Systems, NIL Technology.

Contact:

Debora White

Manager - Marketing

debora@reportstack.com

Ph: +1-888-789-6604

Reportstack Market Research

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