Report : Global Mask Inspection Equipment Market 2016-2020 is a new market research publication announced by Reportstack.
Report Outline: The semiconductor market is shifting toward complex and miniaturized devices. Semiconductor device manufacturers need higher inspection sensitivity as they move toward lower node sizes (10nm and beyond). The migration will introduce complex structures and designs, as well as new materials.
Mask inspection equipment is fab equipment that is used, before lithography, to inspect photomasks for defects during the production of semiconductor wafers. It is also used for R&D purposes. The increase in the application of semiconductor integrated circuits (ICs) in segments like consumer electronics, automobiles, and industries is prompting IC vendors to raise their production scales. This will compel the vendors to demand more mask inspection equipment to ensure maximum reliability of their offerings.
For detailed report with TOC, please click here Global Mask Inspection Equipment Market 2016-2020.
Market Growth: The global mask inspection equipment market is expected to grow at a CAGR of 11.27% during the period 2016-2020.
• Applied Materials
• Lasertech Corporation
Other prominent vendors:
• Carl Zeiss
• Hermes Microvision (HMI)
• Planar Corporation
• Rudolph Technologies
KLA-Tencor, Applied Materials, Lasertech Corporation, Carl Zeiss, FEI, Hermes Microvision (HMI), JEOL, Nanometrics, Nikon, Planar Corporation, Rudolph Technologies.
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